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Perimembranous Ventricular Septal Defect as a Transcatheter Aortic Valve Implantation (TAVI) Complication

Perimembranous Ventricular Septal Defect as a Transcatheter Aortic Valve Implantation (TAVI) Complication▶ Watch on YouTube — age-restricted, cannot embed here

Imaging findings

Pre-operative CT shows no ventricular septal defect (VSD), but some asymmetric calcification of the mitral-aortic curtain. Post-operative CT following TAVI reveals a new small perimembranous VSD located directly below the implanted TAVI valve.

Key takeaways

A perimembranous VSD is a rare, but reported, complication of TAVI, presumed to be created during the procedure. Proposed mechanisms include over-inflation/over-dilation of the valve, increased calcium effect, or wire injury. It should be considered if patients develop worsening heart failure symptoms after TAVI.

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